EUV Lithography Technology for High-volume Production of Semiconductor Devices

Semiconductor Devices and Technology

PREFACE It is customary for a book to have a preface, wherein the author explains why he wrote it and how it differs from all the other books on a similar subject. This book came about because I was asked to update one of our sophomore courses, in part to add some material on semiconductor devices and technology and in part to increase the breadth of the course and improve its links to other pa...

EUV Lithography—The Successor to Optical Lithography?

This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the...

Optimization of EUV laser and discharge devices for high-volume manufacturing

Both Laser and Discharge produced plasma (LPP and DPP) are being used as a light source for EUV lithography. A key challenge for the EUV radiation plasma devices is achieving sufficient brightness to support the throughput requirements of High-Volume Manufacturing lithography exposure tools. One method for improving source brightness is to simulate the source environment in order to optimize th...

Approach to EUV Lithography Simulation

Numerical Simulation of Laser-produced Plasma Devices for Euv Lithography Using the Heights Integrated Model

Laser-produced plasma (LPP) devices have been modeled as the light source for extreme ultraviolet (EUV) lithography. A key challenge for LPP is achieving sufficient brightness to support the throughput requirements of high-volume manufacturing. An integrated model (HEIGHTS) was applied to simulate the environment of EUV sources and optimize their output. The model includes plasma evolution and ...