منابع مشابه
EUV Lithography—The Successor to Optical Lithography?
This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the...
متن کامل244-nm imaging interferometric lithography
Imaging interferometric lithography, combining off-axis illumination, multiple exposures covering different regions of spatial frequency space, and pupil plane filters to ensure uniform frequency-space coverage, is a relatively new imaging concept that provides an approach to accessing the fundamental, linear-systems-resolution limits of optics. With an air medium between the lens and the wafer...
متن کاملLonger Wavelength EUV Lithography (LW-EUVL)
Extreme UV Lithography (EUVL) is generally accepted as the leading candidate for next generation lithography. Several challenges remain for EUVL, especially as its insertion point is pushed to finer resolution. Although diffractive scaling may suggest a transition to shorter EUVL wavelengths, several issues arise that would make that difficult. Challenges involve issues such as flare, multilaye...
متن کاملModeling and optimization of mass-limited targets for EUV Lithography
Current challenges in the development of efficient laser produced plasma (LPP) sources for EUV lithography are increasing EUV power at IF and maximizing lifetime and therefore, reducing cost of devices. Mass-limited targets such as small tin droplets are considered among the best choices for cleaner operation of the optical system because of lower mass of atomic debris produced by the laser bea...
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ژورنال
عنوان ژورنال: Physics and High Technology
سال: 2011
ISSN: 1225-2336
DOI: 10.3938/phit.20.002