Enhanced Growth Rate of Chemical Vapor Deposition Diamond Coating Motivated by Graphene Oxide

To improve the growth rate of chemical vapor deposition (CVD) diamond coating, increasing reaction is essential. A novel method dispersing graphene oxide (GO) particles as adsorbent on substrate prior to was proposed, with which coating large grain size and high thickness deposited silicon nitride under normal CVD environment. The as-deposited characterized by scanning electron microscopy (SEM), surface profilometer, atomic force microscope (AFM), Raman spectrum, indentation. morphologies showed that GO were covered a layer coating. without had rates 1.10–1.38 1.50–2.94 μm h−1, respectively. No differences in spectra microcrystalline (MCD) coatings found. Indentation tests suggested could enhance adhesive strength crack resistance may result from strong adsorbed capacity destructive energy. Hence, can be regarded potential alternative technique accelerating obtain desired