Electron mobility in Si delta doped GaAs

Electron mobility in Si delta doped GaAs

We have measured the transport and quantum mobility in Si delta doped samples as a function of the doping concentration and the thickness of the doping layer. The results are compared with mobility calculations which show that the ionized impurity scattering rate is determined by the fluctuations in the charge distribution of the delta layer instead of the full charge distribution itself.

Quantum- and transport electron mobility in the individual subbands of a two-dimensional electron gas in Si-S-doped GaAs

ELECTRON - PHONON SCATTERING IN Si DOPED GaN

Phonon-plasmon scattering in non-resonant Raman spectroscopy is used to determine the free electron concentration in Si doped GaN films. For various doping concentration and variable temperature the correlation with magneto-transport data is established. The freeze-out of the carrier concentration at low temperature is thus observed in a purely optical detection scheme. We observe a very long t...

Subband population and electron subband mobility for two interacting Si- -doping layers in GaAs

Experimental observation of a minority electron mobility enhancement in degenerately doped p-type GaAs

The variation of minority electron mobility with doping density in p+-GaAs has been measured with the zero-field time-of-flight technique. The results from a series of nine GaAs films doped between 1 X lOI and 8 X 10” cmm3 show the mobility decreasing from 1950 cm2 V-’ s-l at 1 X 10” cmm3 to 1370 cm2 V-l s-l at 9X 10” cmB3. For the doping range 9 x 1018-8x 1019 cme3, the decreasing trend in mob...