ELECTRON BEAM WRITING ERASURE SWITCHES

Molecule-by-molecule writing using a focused electron beam.

The resolution of lithography techniques needs to be extended beyond their current limits to continue the trend of miniaturization and enable new applications. But what is the ultimate spatial resolution? It is known that single atoms can be imaged with a highly focused electron beam. Can single atoms also be written with an electron beam? We verify this with focused electron-beam-induced depos...

Palamedes' "Writing Lesson": On Writing, Narrative, and Erasure

Proton beam writing

the integration of moving parts on a chip, there is expected to Proton beam (p-beam) writing is a new direct-writing process that uses a focused beam of MeV protons to pattern resist material at nanodimensions. The process, although similar in many ways to direct writing using electrons, nevertheless offers some interesting and unique advantages. Protons, being more massive, have deeper penetra...

Measurements of Photon Beam Flattening Filter Using an Anisotropic Analytical Algorithm and Electron Beam Employing Electron Monte Carlo

  Introduction: This study aimed to report the measurement of photon and electron beams to configure the Analytical Anisotropic Algorithm and Electron Monte Carlo used in clinical treatment. Material and Methods: All measurements were performed in a large water phantom using a 3-dimensional scanning system (PTW, Germany). ...

Electron Beam-Induced Writing of Nanoscale Iron Wires on a Functional Metal Oxide

Electron beam-induced surface activation (EBISA) has been used to grow wires of iron on rutile TiO2(110)-(1 × 1) in ultrahigh vacuum. The wires have a width down to ∼20 nm and hence have potential utility as interconnects on this dielectric substrate. Wire formation was achieved using an electron beam from a scanning electron microscope to activate the surface, which was subsequently exposed to...