Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

Abstract Surface nanopatterning of semiconductor optoelectronic devices is a powerful way to improve their quality and performance. However, photoelectric devices’ inherent stress sensitivity inevitable warpage pose huge challenge on fabricating nanostructures large-scale. Electric-driven flexible-roller nanoimprint lithography for the wafer proposed in this study. The flexible template twining around roller continuously released recovered, controlled by roller’s simple motion. electric field applied substrate provides driving force. contact line gradually moves with enable scanning adapting entire warped substrate, under field. In addition, force generated from surface so that free external pressure. Furthermore, liquid resist completely fills microcavities force, ensure fidelity nanostructures. technology validated prototype. Finally, nano-grating structures are fabricated gallium nitride light-emitting diode chip adopting solution, achieving polarization light source.