Effect of capacitive coupling in a miniature inductively coupled plasma source
نویسندگان
چکیده
منابع مشابه
Effect of capacitive coupling on inductively coupled fluorocarbon plasma processing
This article describes results obtained using various plasma and surface diagnostics in a study of inductively coupled fluorocarbon plasmas in which the amount of capacitive coupling was systematically varied. It is found that the plasma density decreases while the electron temperature increases as the amount of capacitive coupling is increased at a constant source power level. The rate at whic...
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 2012
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.4764333