Dissolution properties of ultrathin photoresist films with multiwavelength interferometry
نویسندگان
چکیده
منابع مشابه
Thickness Measurement of Photoresist Thin Films Using Interferometry
Photoresists are polymers sensitive to light, usually in the ultraviolet (UV) range of the electromagnetic radiation spectrum. They are classified into positive and negative. In positive types, the exposed to light region of the photoresist becomes solvable to a developer, while the unexposed one remains unsolvable. In negative types the opposite happens. Photoresists are widely used in micro a...
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After coating, the resist film contains a remaining solvent concentration depending on the resist, the solvent, the resist film thickness and the resist coating technique. The softbake reduces the remaining solvent content in order to: avoid mask contamination and/or sticking to the mask, prevent popping or foaming of the resist by N2 created during exposure, improve resist adhesion to the subs...
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15 صفحه اولEffect of Surface Properties on Wrinkling of Ultrathin Films
Thin films bonded to compliant substrates often develop wrinkles when subjected to an applied or inherent compressive stress. This paper presents a bilayer model to account for surface effects on the wrinkling of ultrathin solid films. Assuming a surface layer of finite thickness, effects of surface properties on the critical strain, the equilibrium wavelength, and the wrinkle amplitude are dis...
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Semenov, A; Günther, B; Böttger, U; Hübers, H W; Bartolf, H; Engel, A; Schilling, A; Ilin, K; Siegel, M; Schneider, R; Gerthsen, D; Gippius, N A Semenov, A; Günther, B; Böttger, U; Hübers, H W; Bartolf, H; Engel, A; Schilling, A; Ilin, K; Siegel, M; Schneider, R; Gerthsen, D; Gippius, N A (2009). Optical and transport properties of ultrathin NbN films and nanostructures. Physical Review B, 80(5...
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ژورنال
عنوان ژورنال: Journal of Physics: Conference Series
سال: 2005
ISSN: 1742-6588,1742-6596
DOI: 10.1088/1742-6596/10/1/098