Development process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD).
نویسندگان
چکیده
منابع مشابه
Deposition of permalloy films by filtered cathodic vacuum arc
The filtered cathodic vacuum arc technique was employed to deposit magnetic films such as FeNi on silicon substrate. Using the normal cathode design, tetrahedral amorphous carbon and metals films can be deposited. If a magnetic target is used, the arc spot always preferably moves to the edge of the target and then extinguishes. Therefore, the arc is not stable and no film can be deposited. A ca...
متن کاملFiltered cathodic arc deposition with ion-species-selective bias.
A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon films, where the bias was applied and adjusted when the carbon plasma was condensing and the subs...
متن کاملNitrogenated tetrahedral amorphous carbon films prepared by ion-beam-assisted filtered cathodic vacuum arc technique for solar cells application
Fabrication and characterization of nitrogenated tetrahedral amorphous carbon (ta-C:N) semiconductor/crystalline p-type silicon (p-Si) heterojunction structures are reported. The electron-hole pairs generated from both ta-C:N and Si depletion regions were observed from photoresponse measurements. The peaks are centered at about 540 and 1020 nm, which correspond to the optical absorption edge of...
متن کاملProperties of nitrogen doped tetrahedral amorphous carbon films prepared by filtered cathodic vacuum arc technique
The properties of nitrogen doped tetrahedral amorphous carbon films prepared by the filtered cathodic vacuum arc technique have been studied. The doping species, nitrogen ions, were produced by an ion beam source. The nitrogen flow rate was varied from 0.5 to 10 sccm while keeping other deposition conditions constant. The nitrogen content in deposited films was determined by Rutherford backscat...
متن کاملCyclic Voltammetric Behavior of Nitrogen-Doped Tetrahedral Amorphous Carbon Films Deposited by Filtered Cathodic Vacuum Arc
Nitrogen-doped tetrahedral amorphous carbon (ta-C :N) films were deposited by filtered cathodic vacuum arc (FCVA) technique using nitrogen as a background gas. The structure of the ta-C :N films was studied with X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy in terms of nitrogen flow rate used during the film deposition. Potential windows of the films measured in deaerated and un...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Bulletin of Bryansk state technical university
سال: 2014
ISSN: 1999-8775
DOI: 10.12737/23189