Dependence of PMMA electron beam resist sidewall shape on exposure dose and resist thickness
نویسندگان
چکیده
The influence of electron beam lithography parameters (such as energy, resist thickness, the exposure dose) on sidewall shape (profile) was studied for PMMA (polymethyl-methacrylate) positive resist. profile tone investigated depending varying doses thicknesses 600 and 1300 nm, energy 30 keV. Simulation results based measurements along depth are presented discussed. obtained contribute to knowledge scattering in resist/substrate case field emission cathode Gaussian intensity distribution, development approval models prediction precise control profiles thick layers 3D proximity effect simulation, bilayer system, lift-off method.
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ژورنال
عنوان ژورنال: Nucleation and Atmospheric Aerosols
سال: 2021
ISSN: ['0094-243X', '1551-7616', '1935-0465']
DOI: https://doi.org/10.1063/5.0067068