Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies

Nanostructured materials made from group 10 (Ni, Pd, Pt) and 11 (Cu, Ag, Au) elements have outstanding technological relevance in microelectronics, nano-optics, catalysis, energy conversion. Processes that allow for the easy reliable fabrication of such nanostructures are heavily sought after. Focused electron beam induced deposition (FEBID) is only direct-write technique can fabricate with arbitrary shape dimensions down to sub-10 nm regime. However, complex chemistry FEBID involving electron-induced dissociation processes metalorganic precursors molecules, surface kinetics, thermal effects poorly understood far being optimized. Here, we review a comparative manner performance underlying chemical reactions processes, namely, vapour (CVD), atomic layer (ALD), itself. The knowledge gained CVD ALD as related techniques will help us understand spatially selective occurring FEBID. Fundamental gas phase studies provide insight desorption precursor fragments. Specific emphasis put on type ligands their different behaviour under thermal, surface-related, processes. comprehensive overview current state metals includes reactive environments purification approaches these may valuable information design novel precursors. evaluation process extended include W, Co, Fe, Ru, Rh, Ir represent general guide towards future developments These not rely compounds but also optimized strategies inspired by CVD.