Contrast Analysis of Polarization in Three-Beam Interference Lithography

This paper analyzes the effect of polarization and incident angle on contrasts interference patterns in three-beam lithography. A non-coplanar laser system was set up to simulate relationship between contrast, beam polarization, angle. Different pattern periods require different angles, which means contrast losses Two modes were presented study effects with angles based theoretical analysis simulations. In case co-directional component TE mode, it demonstrated that decreases increase loss caused by error also grew rapidly. By changing mode azimuthal (TE-TE-TE) can be ensured remain above 0.97 even though is large. addition, TE-TE-TE accept larger errors. conclusion provides a basis for generation high-contrast light fields at applicable multi-beam