Chemical wet etching of germanium assisted with catalytic-metal-particles and electroless-metal-deposition
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چکیده
منابع مشابه
Catalytic activity of noble metals for metal-assisted chemical etching of silicon
Metal-assisted chemical etching of silicon is an electroless method that can produce porous silicon by immersing metal-modified silicon in a hydrofluoric acid solution without electrical bias. We have been studying the metal-assisted hydrofluoric acid etching of silicon using dissolved oxygen as an oxidizing agent. Three major factors control the etching reaction and the porous silicon structur...
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Department of Physics and Materials Scien Chee Avenue, Kowloon Tong, Kowloon, Hon Department of Biology and Chemistry, Cit Avenue, Kowloon Tong, Kowloon, Hong Kon Centre for Functional Photonics (CFP), Cit Avenue, Kowloon Tong, Kowloon, Hong Kon Shenzhen Research Institute, City Universit † Electronic supplementary informa 10.1039/c4ra06172a ‡ These authors contributed equally to th Cite this: ...
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A simple and effective method is presented for producing light-emitting porous silicon ~PSi!. A thin (d,10 nm! layer of Au, Pt, or Au/Pd is deposited on the ~100! Si surface prior to immersion in a solution of HF and H2O2 . Depending on the type of metal deposited and Si doping type and doping level, PSi with different morphologies and light-emitting properties is produced. PSi production occur...
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In this paper metal-assisted chemical etching has been applied to pattern porous silicon regions and silicon nanohole arrays in submicron period simply by using positive photoresist as a mask layer. In order to define silicon nanostructures, Metal-assisted chemical etching (MaCE) was carried out with silver catalyst. Provided solution (or materiel) in combination with laser interference lithogr...
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Many potential applications of porous silicon nanowires (SiNWs) fabricated with metal-assisted chemical etching are highly dependent on the precise control of morphology for device optimization. However, the effects of key etching parameters, such as the amount of deposited metal catalyst, HF-oxidant molar ratio (χ), and solvent concentration, on the morphology and etching kinetics of the SiNWs...
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ژورنال
عنوان ژورنال: Electrochimica Acta
سال: 2016
ISSN: 0013-4686
DOI: 10.1016/j.electacta.2016.08.016