Chemical vapour deposition of group Vb metal phosphide thin films
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Chemical vapour deposition of Group Vb metal phosphide thin films
The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 and VOCl3 with cyclohexylphosphine at substrate temperatures of 600 C deposits thin films of amorphous vanadium phosphide. The films are black/gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500 C – 600 C deposits films of crystalline -MP ...
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ژورنال
عنوان ژورنال: Journal of Materials Chemistry
سال: 2003
ISSN: 0959-9428,1364-5501
DOI: 10.1039/b304084b