Chemical vapor deposition of tungsten oxide
نویسندگان
چکیده
منابع مشابه
Tetragonal tungsten oxide nanobelts synthesized by chemical vapor deposition
Tungsten trioxide (WO3) nanobelts in tetragonal structure were grown on Si substrates by a hot-wall chemical vapor deposition (CVD) method without using catalysts. The products were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM), Raman spectroscopy, and photoluminescence (PL) spectrum. The width of the nanobelts is in the ran...
متن کاملModel Reduction for a Tungsten Chemical Vapor Deposition
A model of a tungsten chemical vapor deposition (CVD) system is developed to study the CVD system thermal dynamics and wafer temperature nonuniformities during a processing cycle. We develop a model for heat transfer in the system’s wafer/susceptor/guard ring assembly and discretize the modeling equation with a multiple-grid, nonlinear collocation technique. This weighted residual method is bas...
متن کاملTungsten Oxide Nanorods Array and Nanobundle Prepared by Using Chemical Vapor Deposition Technique
Tungsten oxide (WO3) nanorods array prepared using chemical vapor deposition techniques was studied. The influence of oxygen gas concentration on the nanoscale tungsten oxide structure was observed; it was responsible for the stoichiometric and morphology variation from nanoscale particle to nanorods array. Experimental results also indicated that the deposition temperature was highly related t...
متن کاملChemical Vapor Deposition Synthesis of Novel Indium Oxide Nanostructures in Strongly Reducing Growth Ambient
The current study reports some interesting growth of novel In2O3 nanostructures using ambient-controlled chemical vapor deposition technique in the presence of a strongly reducing hydrazine ambient. The experiments are systematically carried out by keeping either of the carrier gas flow rate or the source temperature constant, and varying the other. For each of the depositions, the growth is st...
متن کاملTwo-Stage Chemical Deposition of Oxide Films
Two-stage chemical deposition (TSCD) technique is used to produce ZnO, Mn2O3 and NiO films on soda-lime glass (SL-G) from an aqueous solution of zinc, manganese and nickel complex, respectively. The TSCD method enables the deposition of metal oxide thin films with a thickness which can be controlled during the preparation procedure. The ZnO, Mn2O3 and NiO thin films were polycrystalline films w...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Applied Organometallic Chemistry
سال: 1998
ISSN: 0268-2605,1099-0739
DOI: 10.1002/(sici)1099-0739(199803)12:3<155::aid-aoc688>3.0.co;2-z