Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties

Transition metal ferrites, such as CoFe2O4 (CFO) and NiFe2O4 (NFO), have gained increasing attention potential materials for supercapacitors. Since chemical vapor deposition (CVD) offers advantages like interface quality to the underlying substrates possibility coverage of 3D substrates, two CVD processes are reported CFO NFO. Growth rates amount 150 200 nm h?1 yield uniform, dense, phase pure spinel ferrite films according X-ray diffraction (XRD), Raman spectroscopy, Rutherford backscattering spectrometry nuclear reaction analysis (RBS/NRA) scanning electron microscopy (SEM). Atom probe tomography (APT) synchrotron photoelectron spectroscopy (XPS) give insights into vertical homogeneity oxidation states in films. Cation disorder is analyzed first time from synchrotron-based XPS. NFO via lab-based Depositions on conducting Ni Ti result electrodes with pseudocapacitive behavior, evidenced by cyclovoltammetry (CV) experiments. The interfacial capacitances up 185 µF cm?2.