Characterization of stacking faults in 4H-SiC epilayers by room-temperature microphotoluminescence mapping

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Optical investigations techniques used for stacking faults characterization in SiC

Stacking Faults (SFs) are important crystal defects in 4H-SiC [1]. They can be electrically active and, in this case, behave as deep quantum well (QW) traps for electrons [2]. This leads to the degradation of high voltage bipolar diodes [3]. The basic origin of SFs in SiC is the small total energy difference between two different polytypes. The net consequence is that they can appear spontaneou...

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Structure of “star” defect in 4H-SiC substrates and epilayers

The structure of the “star” defect in 4H-SiC substrates and its effects on the extended defect structures in the epilayers were studied by molten KOH etching and transmission x-ray topography. Star defects consist of a center region with high densities of threading dislocations (both edge and screw types) and six arms of dislocation arrays extending along <11-20> directions. In addition, multip...

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Optical Investigations of stacking faults in 4H-SiC epitaxial layers: comparison of 3C and 8H polytypes

We present an analysis of the electronic structure of in-grown 3C and 8H stacking faults (SFs) in a 4H-SiC matrix. First the concept of low temperature photoluminescence optical signature of SFs is discussed. Then, the results of type-II quantum well (QW) model calculations are displayed, taking into account the effect of valence band offset, internal polarization field and non homogeneity of t...

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Electronic driving force for stacking fault expansion in 4H-SiC

Trapping of electrons in stacking fault SF interface states may lower the energy of a SF more than it costs to form the SF. This “electronic stress” driving force for SF expansion is evaluated for single and double stacking faults in 4H-SiC in terms of a two-dimensional free-electron density of states model based on first-principles calculations. In contrast with previous work, which claimed th...

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ژورنال

عنوان ژورنال: Applied Physics Letters

سال: 2008

ISSN: 0003-6951,1077-3118

DOI: 10.1063/1.2937097