Characteristics of Optical Emission Spectroscopy Spectrum on Graphite Deposition Process with Sputtering Method

Abstract The deposition process using the sputtering method is a technique that produces thin layer. can be used with some modifications made to system. One of identifications through results Optical Emission Spectroscopy (OES) spectrum. By analyzing OES spectrum in system, it seen condition plasma formation chamber. gas system Argon. varying voltage, flow rate, pressure and temperature substrate, found argon ionized at voltage 140 V, rate 60 ml/min, 15 Pa substrate 200°C. SEM-EDX characterization showed graphite growing on had been identified around 6.5%.