Characteristics of Diamondlike Carbon Film Deposited by Magnetron Plasma Enhanced Chemical Vapor Deposition Using a Roll Coater.
نویسندگان
چکیده
منابع مشابه
Determination of Optical Properties in Germanium Carbon Coatings Deposited by Plasma Enhanced Chemical Vapor Deposition
In this research, Germanium-carbon coatings were deposited on ZnS substrates by plasma enhanced chemical vapor deposition (PECVD) using GeH4 and CH4 precursors. Optical parameters of the Ge1-xCx coating such as refractive index, Absorption coefficient, extinction coefficient and band gap were measured by the Swanepoel method based on the transmittance spectrum. The results showed that the refra...
متن کاملCharacterization of Ultra Low-k SiOC(H) Film Deposited by Plasma-Enhanced Chemical Vapor Deposition (PECVD)
Copyright 2012 KIEEME. All rights reserved. This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted noncommercial use, distribution, and reproduction in any medium, provided the original work is properly cited. pISSN: 1229-7607 eISSN: 2092-7592 DOI: http://dx...
متن کاملComparison of Properties of Ti/TiN/TiCN/TiAlN Film Deposited by Cathodic Arc Physical Vapor and Plasma-assisted Chemical Vapor Deposition on Custom 450 Steel Substrates
This study investigated the effects of deposition techniques on the microstructural and tribological properties of Ti/TiN/TiCN/TiAlN multilayer coatings onto a Custom 450 steel substrate. The coatings were produced using cathodic arc physical vapor deposition (CAPVD) and plasma-assisted chemical vapor deposition (PACVD). The microstructural of the coatings was evaluated using (SEM), and phase f...
متن کاملMethod for growing a diamond thin film on a substrate by plasma enhanced chemical vapor deposition
متن کامل
A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition
In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives,...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: SHINKU
سال: 2000
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.43.599