Automatic Measurement of Silicon Lattice Spacings in High-Resolution Transmission Electron Microscopy Images Through 2D Discrete Fourier Transform and Inverse Discrete Fourier Transform

Abstract Line width (i.e., critical dimension, CD) is a crucial parameter in integrated circuits. To accurately control the CD manufacturing, reasonable measurement algorithm required. We develop an automatic and accurate method based on two-dimensional discrete Fourier transform for measuring lattice spacings from high-resolution transmission electron microscopy images. Through inverse of central spot pair symmetrical diffraction spots, image containing only set obtained. Then, pixel span spacing calculated through centre gravity method. Finally, we estimate standard value according to half-intensity The silicon crystal constant guarantees accuracy traceability value. experiments, demonstrate efficiency proposed method, which can be conveniently applied measure CDs practical applications.