Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
نویسندگان
چکیده
Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for production uniform, conformal pinhole free NiO with sub-nanometre control on commercial ALD reactor.
منابع مشابه
Introduction to (plasma-enhanced) atomic layer deposition
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ژورنال
عنوان ژورنال: Materials advances
سال: 2021
ISSN: ['2633-5409']
DOI: https://doi.org/10.1039/d0ma00666a