Atomic Layer Deposition: Overview and Applications

Atomic layer deposition: an overview.

Applications of atomic layer deposition in solar cells.

Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectro...

Atomic Layer Deposition of Praseodymium Aluminum Oxide for Electrical Applications

Praseodymium aluminum oxide (PAO) thin films were grown by atomic layer deposition (ALD) from a new precursor, tris(N,N′-diisopropylacetamidinato) praseodymium, (Pr(amd)3), trimethylaluminum (TMA), and water. Smooth, amorphous films having varying compositions of the general formula PrxAl2–xO3 were deposited on HF-last silicon and analyzed for physical and electrical characteristics. The films ...

Atomic Layer Deposition of TiO

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Thin, high atomic weight refractory film deposition for diffusion barrier, adhesion layer, and seed layer applications

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