“Atomic Layer Deposition in Energy Conversion Applications”

Atomic layer deposition, a unique method for the preparation of energy conversion devices

Most of the technical development of the 19th and 20th centuries relied on thermal engines to generate mechanical or electrical work from the combustion of fossil fuels [1]. This strategy of energy production is not renewable, in that finite resources are consumed and greenhouse gases are emitted, and it is also fundamentally inefficient as defined by Carnot. In a more modern strategy which cir...

Applications of atomic layer deposition in solar cells.

Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectro...

Atomic Layer Deposition of Praseodymium Aluminum Oxide for Electrical Applications

Praseodymium aluminum oxide (PAO) thin films were grown by atomic layer deposition (ALD) from a new precursor, tris(N,N′-diisopropylacetamidinato) praseodymium, (Pr(amd)3), trimethylaluminum (TMA), and water. Smooth, amorphous films having varying compositions of the general formula PrxAl2–xO3 were deposited on HF-last silicon and analyzed for physical and electrical characteristics. The films ...

Atomic layer deposition: an overview.

Atomic Layer Deposition of TiO

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