Anisotropy control in magnetic nanostructures through field-assisted chemical vapor deposition
نویسندگان
چکیده
منابع مشابه
Plasmon-assisted chemical vapor deposition.
We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PA...
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ژورنال
عنوان ژورنال: Nanoscale Advances
سال: 2019
ISSN: 2516-0230
DOI: 10.1039/c9na00467j