An insight to current collapse in GaN HEMT and suppressing techniques
نویسندگان
چکیده
Abstract High Electron Mobility Transistors (HEMT) made of aluminum gallium nitride/gallium nitride (AlGaN/GaN) have become a major focus for all electronic devices based on due to its excellent system characteristics. AlGaN/GaN HEMTs severe problems that degrade their performance and the drain current collapse (CC) is one them. During switching operations, CC increases on-resistance (R ON ) leading an increase in device loss temperature. This review features basics related HEMT significance degradation. paper concerned with various advancements reported recent years suppress GaN HEMT. Various techniques such as passivation, illumination, free-standing substrate, cap layer including high resistivity layer, structure, surface treatment deposition techniques, buffer design, field plates (FP) been introduced by researchers combat CC. analysis will help employ suitable design future development.
منابع مشابه
GaN HEMT reliability
0026-2714/$ see front matter 2009 Elsevier Ltd. A doi:10.1016/j.microrel.2009.07.003 * Corresponding author. Tel.: +1 617 253 4764; fax E-mail address: [email protected] (J.A. del Alamo). This paper reviews the experimental evidence behind a new failure mechanism recently identified in GaN high-electron mobility transistors subject to electrical stress. Under high voltage, it has been found that el...
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ژورنال
عنوان ژورنال: Engineering research express
سال: 2023
ISSN: ['2631-8695']
DOI: https://doi.org/10.1088/2631-8695/acb131