Amorphous plating.

Application of Pulse Plating - Amorphous Alloys

Amorphous alloys can be electrodeposited by direct or pulsed current. According to electrocrystallization theory, a high crystallization overpotential produces microcrystalline structure in the deposits. Thus if the amorphous phase consists of microcrystals, pulsed current is preferable for preparing amorphous alloys. However, another newly proposed theory holds that the amorphous phase structu...

Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

Highly tetrahedral, dense amorphous carbon ~ta-C! films have been deposited using rf sputtering of graphite by an unbalanced magnetron with intense dc Ar-ion plating at low temperatures ~,70 °C!. The ratio of the argon ion flux to neutral carbon flux F i/Fn is about 5. The film density and compressive stress are found to pass through a maximum of 2.7 g/cm and 16 GPa, respectively, at an ion pla...

Plating Hydrogen

Cathodic activation examined with reference to the cold fuslon developments (controversy). Historically cathodic activation has been used for plating preparation of p a s s i v e (o x i d e) s u r f a c e s e.g. nickel/chromium alloys, niobium and powdered metals. More recent results of work employing cathodic activation for preparing aluminum for plating will be presented e.g. process paramete...

Multichannel plating unit for high-throughput plating of cell cultures.

High-throughput genomic approaches to gene function or target identification have led to the development and implementation of the 96-well format for many standard molecular biology manipulations. The apparatus described here, a Multichannel Plating Unit, is designed to plate out individual cultures efficientlyfrom standard 96-well culture blocks. Following transformation, aliquots of culture a...

Multiple Amorphous–amorphous Transitions