Amorphizing noble metal chalcogenide catalysts at the single-layer limit towards hydrogen production

Rational design of noble metal catalysts with the potential to leverage efficiency is vital for industrial applications. Such an ultimate atom-utilization can be achieved when all atoms exclusively contribute catalysis. Here, we demonstrate fabrication a wafer-size amorphous PtSex film on SiO2 substate via low-temperature amorphization strategy, which offers single-atom-layer Pt high (~26 wt%). This (1.2 < x 1.3) behaves as fully activated surface, accessible catalytic reactions, and features nearly 100% current density relative pure surface reliable production sustained high-flux hydrogen over 2 inch wafer proof-of-concept. Furthermore, electrolyser demonstrated generate 1,000 mA cm−2. strategy potentially extendable other metals, including Pd, Ir, Os, Rh Ru elements, demonstrating universality catalysts. The scarcity price pose critical challenges chemical industry, finding strategies that ensure complete atom has become pivotal endeavour. work introduces single-layer evolution reaction efficiency.