A SiGe-Source Doping-Less Double-Gate Tunnel FET: Design and Analysis Based on Charge Plasma Technique with Enhanced Performance
نویسندگان
چکیده
In this article, a distinctive charge plasma (CP) technique is employed to design two doping-less dual gate tunnel field effect transistors (DL-DG-TFETs) with Si0.5Ge0.5 and Si as source material. The CP methodology resolves the issues of random doping fluctuation activation. analog RF performance has been investigated for both proposed devices i.e. DL-DG-TFET Si-source in terms drive current, transconductance, cut-off frequency. addition, linearity distortion analysis carried out respect higher order transconductance (gm2 gm3), VIP2, IMD3, HD2. better characteristics reliability compare owing low energy bandgap material mobility. switching ratio obtained 5 × 1014 that makes it suitable contender power applications.
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ژورنال
عنوان ژورنال: Silicon
سال: 2021
ISSN: ['1876-9918', '1876-990X']
DOI: https://doi.org/10.1007/s12633-021-01030-6