A New Monocyclic Fluoropolymer for 157-nm Photoresists
نویسندگان
چکیده
منابع مشابه
Single Layer Fluoropolymer Resists for 157 nm Lithography
We have developed a family of 157 nm resists that utilize fluorinated terpolymer resins composed of 1) tetrafluoroethylene (TFE), 2) a norbornene fluoroalcohol (NBFOH), and 3) t-butyl acrylate (t-BA). TFE incorporation reduces optical absorbance at 157 nm, while the presence of a norbornene functionalized with hexafluoroisopropanol groups contributes to aqueous base (developer) solubility and e...
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Photolithography at 157 nm requires development of new photoresists that are highly transparent at this wavelength. Transparent fluoropolymer platforms have been identified which also possess other materials properties required for chemically amplified imaging and aqueous development. Polymers of tetrafluoroethylene (TFE), a fluoroalcohol-substituted norbornene and an acid-labile acrylate ester...
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Top surface imaging (TSI) has had an interesting history. This process showed great promise in the late 1980’s and several attempts were made to introduce it to full-scale manufacturing. Unfortunately, defect density problems limited the process and it fell from favor. TSI emerged again as an important part of the EUV and 193 nm strategies in the early stages of those programs because it offere...
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15 صفحه اولBottom Anti-Reflective Coatings (BARCs) for 157-nm!Lithography
Bottom anti-reflective coatings (BARCs) are essential for achieving the 65-nm node resolution target by minimizing the substrate reflectivity to less than 1% and by planarizing substrates. We believe that the developments in 157-nm BARC products are on track to make them available for timely application in 157-nm lithography. We have made some significant improvements in resist compatibility an...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2004
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.17.639