منابع مشابه
Maskless Plasmonic Lithography at 22 nm Resolution
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We have developed a multilevel interference lithography process to fabricate 50 nm period gratings using light with a 351.1 nm wavelength. In this process multiple grating levels patterned by interference lithography are overlaid and spatial-phase aligned to a common reference grating using interferometry. Each grating level is patterned with offset phase shifts and etched into a single layer t...
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The growth of the semiconductor industry is driven by Moore’s law: “The complexity for minimum component cost has increased at a rate of roughly a factor of two per year” [1]. Notice that Moore observed that not only was the number of components doubling yearly, but was doing so at minimum cost. One of the main factors driving the improvements in complexity and cost of ICs, is improvements in p...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2006
ISSN: 1094-4087
DOI: 10.1364/oe.14.006434