The most commonly used method for the production of thin films is based on deposition of atoms or molecules onto a solid surface. One of the suitable method is to produce high quality metallic, semiconductor and organic thin film is Ionized cluster beam deposition (ICBD), which are used in electronic, robotic, optical, optoelectronic devices. Many important factors such as cluster size, cluster...

Molecular dynamics simulations of the sputtering of Si by C60 keV bombardment are performed in order to understand the importance of chemical reactions between C atoms from the projectile and Si atoms in the target crystal. The simulations predict the formation of strong covalent bonds between the C and Si atoms, which result in nearly all of the C atoms remaining embedded in the surface after ...

The understanding of different features of the sputtering of materials lies in understanding the factors contributing to the emission of atoms from a regular crystal structure at the surface. Although the sputtering of fcc crystals has received much attention, the database on bcc materials is still scarce. We use molecular dynamics simulations to study the self-sputtering of the (100), (110), (...

New sputter deposition processes, such as biased target ion beam deposition, are beginning to be used to grow metallic superlattices. In these processes, sputtering of a target material at ion energies close to the threshold for the onset of sputtering can be used to create a low energy flux of metal atoms and reflected neutrals. Using embedded atom method potentials for fcc metals and a univer...

Ion irradiation of nanoparticles leads to enhanced sputter yields if the nanoparticle size is of the order of the ion penetration depth. While this feature is reasonably well understood for collision-cascade sputtering, we explore it in the regime of collision-spike sputtering using molecular-dynamics simulation. For the particular case of 200-keV Xe bombardment of Au particles, we show that co...

Plasma sputtering is one of the most promising methods for reducing the amount of platinum catalyst in porous electrodes for low temperature fuel cells. Here, a simulation of the platinum deposition by radio frequency plasma sputtering has been developed and compared with experimental results to allow optimization of the deposition process. In the simulation, the transport of sputtered atoms th...

The direct collisional interaction of magnetospheric particles with Io will lead to sputtering of atoms and molecules from the satellite into circum-Jovian space. The -•520-eV S (and -•260-eV O) ions composing the Io toms are the most effective agents for net sputter emoval of matter from the satellite. An incident flux of-•10 •ø cm -2 s -• is estimated to provide -•5 x 10 •ø S atoms cm -2 s -•...

Following the recent report by Andersen et al. of extremely large nonlinear sputtering yields caused by the bombardment of gold targets with small, high energy gold clusters [Phys. Rev. Lett. 80 (1998) 5433], we carried out simulations showing: (1) that the thermal spike phase of the collision cascade contributes significantly to these nonlinear yields; and (2) that individual 'mega-events' wit...

The absolute sputtering yields of D+, He+ and Li+ on deuterium saturated solid lithium have been measured and modelled at 45◦ incidence in the energy range 100–1000 eV. The Ion–surface InterAction Experiment (IIAX) was used to measure the absolute sputtering yield of lithium in the solid phase from bombardment with a Colutron ion source. The lithium sample was treated with a deuterium plasma fr...