nanoscale science and technology has today mainly focused on the fabrication of nano devices. in this paper, we study the use of lithography process to build the desired nanostructures directly. nanolithography on polymethylmethacrylate (pmma) surface is carried out by using atomic force microscope (afm) equipped with silicon tip, in contact mode. the analysis of the results shows that the dept...

the scanning probe microscopes (spms) based lithographic techniques have been demonstrated as an extremely capable patterning tool. manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. in this paper, a qualified overview of diverse lithog...

Thermal scanning probe lithography (tSPL) is a nanofabrication method for the chemical and physical nanopatterning of large variety materials polymer resists with lateral resolution 10 nm depth 1 nm. In this Primer, we describe working principles tSPL highlight characteristics that make it powerful tool to locally directly modify material properties in ambient conditions. We introduce main feat...

3.2. Two-Photon Lithography (TPL) 919 4. Serial Writing with Charged Particles 920 4.1. Electron Beam Lithography 920 4.2. Ion Beam Lithography 920 4.3. Scanning Probe Resist Lithography 921 5. Microand Nanomachining 921 5.1. Focused Ion Beam 921 5.2. Scanning Probe Nanomachining 921 6. Direct Writing and Material Deposition 921 7. Moulding 922 7.1. Mould Fabrication 922 7.2. Demoulding: Mould ...

Force microscopy enables a variety of approaches to manipulate and/or modify surfaces. Few of those methods have evolved into advanced probe-based lithographies. Oxidation scanning probe lithography (o-SPL) is the only lithography that enables the direct and resist-less nanoscale patterning of a large variety of materials, from metals to semiconductors; from self-assembled monolayers to biomole...