نتایج جستجو برای: PECVD Reactor

تعداد نتایج: 30231  

2001
Kumud O. Goyal R. Mahalingam Patrick D. Pedrow Mohamed A. Osman

A pulsed plasma enhanced chemical vapor deposition (PECVD) reactor is used for the preparation of thin polyacetylene films. A theoretical model based on the mass transport characteristics of the reactor is developed in order to correlate with experimentally obtained spatial deposition profiles for the acetylene plasma polymer film deposited within the cylindrical reactor. Utilizing a free radic...

2014
Onno Gabriel Simon Kirner Michael Klick Bernd Stannowski Rutger Schlatmann

A key process in thin film silicon-based solar cell manufacturing is plasma enhanced chemical vapor deposition (PECVD) of the active layers. The deposition process can be monitored in situ by plasma diagnostics. Three types of complementary diagnostics, namely optical emission spectroscopy, mass spectrometry and non-linear extended electron dynamics are applied to an industrial-type PECVD react...

2010

In silicon heterojunction solar cells, the passivation of the crystalline silicon wafer surfaces and fabrication of emitter and back surface field are all performed by intrinsic and doped amorphous silicon thin layers, usually deposited by plasma-enhanced chemical vapor deposition (PECVD). By using in-situ diagnostics during PECVD, it is found that the passivation quality of such layers directl...

2011
A. Descoeudres L. Barraud P. Bôle Rothen S. De Wolf B. Demaurex J. Geissbühler Z. C. Holman C. Ballif

Silicon heterojunction solar cells have high opencircuit voltages thanks to excellent passivation of the wafer surfaces by thin intrinsic amorphous silicon (aSi:H) layers deposited by plasma-enhanced chemical vapor deposition (PECVD). By using in-situ plasma diagnostics and ex-situ film characterization, we show that the best a-Si:H films for passivation are produced from deposition regimes clo...

2010
Burak Caglar Enric Bertran Eric Jover

Plasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically densealigned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD). In this work, we used magnetron sputtering to deposit iron layer as a catalyst on silicon wafers. After that, radio frequency (rf) assisted PECVD reactor was used to grow CNTs. They were treated with wate...

2008
L. F. Velásquez-García A. I. Akinwande

Electrospray is the technique to soft-ionize liquids by applying a high electric potential to a liquid meniscus. The liquid meniscus is deformed into a cone [1], and charged species are emitted from its apex. The emission can be solvated ions, charged droplets, or a mix of the two. This low-divergence charged species source can be used in diverse applications such as mass spectrometry, propulsi...

Journal: :Journal of Physics: Conference Series 2010

Journal: :International Journal of Applied and Computational Mathematics 2015

2006
Hannes SCHMIDT

Feasibility Study of Shaped Electrode The objective of this project was a feasibility study of a novel, large-area plasma reactor for thin film production, based on a shaped electrode technique (“lens”) to compensate the standing wave non-uniformity. Cylindrical Test Reactor In the first phase a cylindrical reactor was designed and constructed to show the “proof of principle” of a novel electro...

Journal: :Physica Status Solidi A-applications and Materials Science 2021

Si nanowires (NWs) are grown by the vapor–liquid–solid method using Cu–Sn bimetallic catalysts in a plasma-enhanced chemical vapor deposition (PECVD) reactor. The microstructure of NWs is analyzed transmission electron microscopy and energy-dispersive X-ray spectroscopy. An amorphous SiO2 region, much larger than native oxide, present on top each crystalline SiNW: SiNWs with diameter below 10 n...

نمودار تعداد نتایج جستجو در هر سال

با کلیک روی نمودار نتایج را به سال انتشار فیلتر کنید