nanoscale science and technology has today mainly focused on the fabrication of nano devices. in this paper, we study the use of lithography process to build the desired nanostructures directly. nanolithography on polymethylmethacrylate (pmma) surface is carried out by using atomic force microscope (afm) equipped with silicon tip, in contact mode. the analysis of the results shows that the dept...

the scanning probe microscopes (spms) based lithographic techniques have been demonstrated as an extremely capable patterning tool. manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. in this paper, a qualified overview of diverse lithog...

We present a versatile and simple methodology for continuous and scalable 2D micro/nano-structure fabrication via sequential 1D patterning strokes enabled by dynamic nano-inscribing (DNI) and vibrational indentation patterning (VIP) as well as a 'single-stroke' 2D patterning using a DNI tool in VIP.

Photoalignment possesses obvious advantages in comparison with the usually “rubbing” treatment of the substrates of liquid crystal display (LCD) cells. The liquid crystal photoalignment is nano-technology, as the thickness of the alignment layer is about 2-15 nm. The application of the photo-alignment and photo-patterning nano technology for the new generation of photonic and display devices wi...

The Scanning Probe Microscopes (SPMs) based lithographic techniques have been demonstrated as an extremely capable patterning tool. Manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. In this paper, a qualified overview of diverse lithog...

In this paper, we report direct patterning of metal nanostructures using an embossed solid electrochemical stamp. Microforming of solid superionic stamps using Si templates--analogous to polymer patterning in nano-imprint lithography--is explored. Silver sulfide (Ag₂S)--a superionic conductor with excellent microforming properties--is investigated as a candidate material. Important parameters o...

The Scanning Probe Microscopes (SPMs) based lithographic techniques have been demonstrated as an extremely capable patterning tool. Manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. In this paper, a qualified overview of diverse lithog...

Imprint lithography is emerging as an alternative nano-patterning technology to traditional photolithography that permits the fabrication of 2D and 3D structures with <100 nm resolution, patterning and modification of functional materials other than photoresist and is low cost, with operational ease for use in developing bio-devices. Techniques for imprint lithography, categorized as either 'mo...

Lithium niobate (LiNbO3) is used in applications such as in optoelectronics, surface acoustic wave devices and transducers. In this paper nano-patterning of LiNbO3 wafers at the wafer scale is investigated using a novel low cost and large-area nano-imprinting technique. The formation of nano-scale pillars is presented by nano-imprinting an ordered nickel etch mask by lift-off on a y-cut LiNbO3 ...

Localized Ge nano-dot formation by laser treatment was investigated and discussed in terms of strain distribution. The advantage of this technique is patterning localization of nano-dots without selective epitaxial growth, reducing costs and improving throughput. Self-assembled Ge nano-dots produced by excimer laser annealing statistically distributed dot density and size dependent on laser ene...