nanoscale science and technology has today mainly focused on the fabrication of nano devices. in this paper, we study the use of lithography process to build the desired nanostructures directly. nanolithography on polymethylmethacrylate (pmma) surface is carried out by using atomic force microscope (afm) equipped with silicon tip, in contact mode. the analysis of the results shows that the dept...

the scanning probe microscopes (spms) based lithographic techniques have been demonstrated as an extremely capable patterning tool. manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. in this paper, a qualified overview of diverse lithog...

Imprint lithography is emerging as an alternative nano-patterning technology to traditional photolithography that permits the fabrication of 2D and 3D structures with <100 nm resolution, patterning and modification of functional materials other than photoresist and is low cost, with operational ease for use in developing bio-devices. Techniques for imprint lithography, categorized as either 'mo...

The processing techniques for micro and nano devices fabrication can be divided into two groups. On one hand, there are the techniques that allow the modification of a given substrate, e.g. ionic implantation, metallization, etching and thermal processes to either grow or deposit insulator layers. On the other hand, there are the processes that allow a pattern transfer of the designs onto the s...

Direct write lithography is used in all phases of nanotechnology development activities. In research, it is utilized to create nanostructures into which functional materials can be patterned on the nano-scale. In process development, direct patterning allows the flexible creation of devices with varying features to optimize behavior. In manufacturing of semiconductors and data storage devices, ...

Nanosphere lithography (NSL) has been studied as the effective method of fabricating nano-scale array. This paper presents template-assisted NSL to obtain high-quality crystal in regularity and coverage. A periodic array of 100 nm deep nano trenches with two different widths, 400 and 450 nm was fabricated by nano imprint lithography (NIL), and used as the template. When polystyrene nanospheres ...

A method based on the sidewall transfer technique for fabricating two-dimensional (2D) nano-mold on a silicon substrate was developed. Instead of using expensive nanolithography, the authors fabricated 2D silicon nano-mold using standard ultraviolet lithography, conformal deposition of gold by radio frequency sputtering, argon sputter etching and deep reactive ion etching (DRIE). This technique...

In Nanosciences, connecting an individual nano-object remains a technological bottleneck. The way nano-objects can be coupled to the micro and macroscopic environment without loosing their intrinsic properties is the main issue of so-called “NanoAddressing”. In LAAS-CNRS, the “Nanoaddressing/Nanobiotechnologies” group, created two years ago, develops and validate new concepts for achieving smar...

We report on the fabrication and characterization of nanoscale solid immersion lenses (nano-SILs) with sizes down to a subwavelength range. Submicrometer-scale cylinders fabricated by electron-beam lithography are thermally reflowed to form a spherical shape. Subsequent soft lithography leads to nano-SILs on transparent substrates for optical characterization. The optical characterization is pe...

The current nano-technology revolution is facing several major challenges: to manufacture nanodevices below 20 nm, to fabricate three-dimensional complex nano-structures, and to heterogeneously integrate multiple functionalities. To tackle these grand challenges, the Center for Scalable and Integrated NAno-Manufacturing (SINAM), a NSF Nanoscale Science and Engineering Center, set its goal to es...