By sputtering organic films with 10 kV, 10 nA C60+ and 0.2 kV, 300 nA Ar+ ion beams concurrently and analyzing the newly exposed surface with X-ray photoelectron spectroscopy, organic thin-film devices including an organic light-emitting diode and a polymer solar cell with an inverted structure are profiled. The chemical composition and the structure of each layer are preserved and clearly obse...

Absolute sputtering yields of liquid tin from 240 to 420 C due to irradiation by low-energy helium and deuterium have been measured. For ion energies ranging from 300 to 1000 eV, temperature enhancement of liquid tin sputtering was noted. These measurements were obtained by IIAX (the Ion-surface InterAction eXperiment) using a velocityfiltered ion beam at 45 incidence to sputter material from a...

It is well known that low and medium energy ion sputtering may induce a fabrication of periodic nanoscale structures on an irradiated surface [1]. Depending on the sputtered substrate characteristics and sputtering conditions, different types of nanoscale structures such as ripples, nanoholes and nanodots can grow on a target during ion beam sputtering [2–6]. These patterns have been found on b...

We describe the setup, characteristics, and application of an in vacuo ion-sputtering and electron-beam annealing device for the postpreparation of scanning probes (e.g., scanning tunneling microscopy (STM) tips) under ultrahigh vacuum (UHV) conditions. The proposed device facilitates the straightforward implementation of a common two-step cleaning procedure, where the first step consists of io...

Absolute sputtering yields of Sn in the solid and liquid phases for incident Hþ, Dþ, and Heþ ions with energies of 300 to 1000 eV were determined via a series of experiments using the ion-surface interaction experiment (IIAX), a facility designed to measure such ion-surface interactions. IIAX incorporates an ion source with an array of ion beam filters and optics to bring a near mono-energetic ...

Recent years have seen a great potential of the focused ion beam (FIB) technology for the nanometer-scale patterning of a freestanding two-dimensional (2D) layer. Experimentally determined sputtering yields of the perforation process can be quantitatively explained using the binary collision theory. The main peculiarity of the interaction between the ion beams and the suspended 2D material lies...

Off-normal ion bombardment of solid targets with energetic particles often leads to development of periodically modulated structures on the surfaces of eroded materials. Ion-induced surface roughening, in its turn, causes sputtering yield changes. We report on a comprehensive theoretical study of the effect of rippled surface morphology on the sputtering yields. The yield is computed as a funct...

Articles you may be interested in Influence of ion source configuration and its operation parameters on the target sputtering and implantation process Rev. Multiply charged ion-induced secondary electron emission from metals relevant for laser ion source beam diagnostics Rev.

The Target Group has recently begun to apply ion beam sputter deposition for target pusher layer fabrication. Metal deposition on both levitated and stalk-mounted fusion targets has been demonstrated. We believe this is the first application of this versatile deposition technique to IF target pusher layerfabrication. Our initial results indicate that ion beam sputtering is far more controllable...