نتایج جستجو برای: DC reactive magnetron sputtering

تعداد نتایج: 217749  

2003
D. J. Christie W. D. Sproul

Reactive co-sputtering is a means to create films of customized or graded index of refraction. This gives the optical coating designer new options, and enables practical realization of new classes of coatings. Two neighboring targets may be sputtered such that material from both targets and reactive gas are incident on the workpiece, depositing a film consisting of a compound. For example, if o...

2012
M. A. Shaheen D. N. Ruzic

Related Articles From sponge to dot arrays on (100) Ge by increasing the energy of ion impacts J. Vac. Sci. Technol. B 30, 06FF12 (2012) Ion-induced effects on grain boundaries and a-Si:H tissue quality in microcrystalline silicon films J. Vac. Sci. Technol. A 30, 061512 (2012) Negative oxygen ion formation in reactive magnetron sputtering processes for transparent conductive oxides J. Vac. Sci...

2014
Qiong Nian Martin Y. Zhang Bradley D. Schwartz Gary J. Cheng

Articles you may be interested in Room temperature deposition of alumina-doped zinc oxide on flexible substrates by direct pulsed laser recrystallization Appl. Optical and electrical properties of transparent conducting B-doped ZnO thin films prepared by various deposition methodsa) Structural, electrical, and optical properties of transparent conductive oxide ZnO:Al films prepared by dc magnet...

2010
J. Borges F. Vaz

AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resis...

2010
Chirag Joshi

CHARACTERIZATION AND CORROSION OF BCC-TANTALUM COATING DEPOSITED ON ALUMINUM AND STEEL SUBSTRATE BY DC MAGNETRON SPUTTERING by Chirag Joshi Tantalum is one of the most versatile highly refractory corrosion-resistant metals. Tantalum coating can be used as an effective corrosion barrier if it is continuous, free from defects and it adheres well to the substrate. A DC magnetron sputtering techniq...

2013
M. R. Fishkis Richard D. Sisson Ronald R. Biederman

Microstructural features of sputtered chromium and chromium-50 wt. % platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf-sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size ofless than 10...

Journal: :journal of sciences islamic republic of iran 0

very smooth thin films of iridium have been deposited on super polished fused silica (sio2) substrates using dc magnetron sputtering in argon plasma. the influence of deposition process parameters on film micro roughness has been investigated. in addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

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