CHARACTERIZATION AND CORROSION OF BCC-TANTALUM COATING DEPOSITED ON ALUMINUM AND STEEL SUBSTRATE BY DC MAGNETRON SPUTTERING by Chirag Joshi Tantalum is one of the most versatile highly refractory corrosion-resistant metals. Tantalum coating can be used as an effective corrosion barrier if it is continuous, free from defects and it adheres well to the substrate. A DC magnetron sputtering techniq...

Microstructural features of sputtered chromium and chromium-50 wt. % platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf-sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size ofless than 10...

very smooth thin films of iridium have been deposited on super polished fused silica (sio2) substrates using dc magnetron sputtering in argon plasma. the influence of deposition process parameters on film micro roughness has been investigated. in addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

Reactive co-sputtering is a means to create films of customized or graded index of refraction. This gives the optical coating designer new options, and enables practical realization of new classes of coatings. Two neighboring targets may be sputtered such that material from both targets and reactive gas are incident on the workpiece, depositing a film consisting of a compound. For example, if o...

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copper thin films with nano-scale structure have numerous applications in modern technology.  in this work, cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by dc magnetron sputtering technique at room temperature in pure ar gas. the sputtering time was considered in 4, 8, 12 and 16 min, respectively. the thickness effect on the structural, morpholo...

Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

Using a combinatorial approach, Cr, Al and C have been deposited onto sapphire wafer substrates by High Power Impulse Magnetron Sputtering (HiPIMS) and DC magnetron sputtering. X-ray photoelectron spectroscopy, X-ray absorption spectroscopy and X-ray diffraction were employed to determine the composition and microstructure of the coatings and confirm the presence of the Cr2AlC MAX phase within ...

CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...