نتایج جستجو برای: vision metrology

تعداد نتایج: 132285  

2008
L. Blunt X. Jiang

This paper provides an overview of advances in the surface metrology field, concerning surface creation, measurement need, instrumentation, characterisation methods and standard development. It indicates industry requirements and further developments for micro and nano scalar surface metrology.

Journal: :Physical Review Letters 2006

Journal: :Nature Photonics 2013

Journal: :Measurement Techniques 2021

The influence of the provisions legal metrology on formation and functioning monetary environment in market is studied. It shown that use tangible (reference) measures for determining value goods units makes it possible to form a stable system, equal all participants. This system can reasonably be attributed information measuring systems. Systems based constant determine money have been formed ...

Journal: :Journal of the Japan Society for Precision Engineering 2009

2008
Julio Ortiz George Verghese Stuart Shaklan Mark Colavita

The New Millennium Interferometer Laser Metrology Testbed is a technology demonstration for a key component of the New Millennium Interferometer (NMI). For the success of NMI, NASA's proposed mission to fly a space-based interferometer, control of its position must be very precise. Laser Metrology is a powerful tool that uses interferometry to make hyper-fine distance measurements. The proposal...

2009
J. E. Muelaner Bin Cai Paul G. Maropoulos

A wide range of metrology processes are involved in the manufacture of large products. In addition to the traditional tool setting and product verification operations increasingly flexible metrology enabled automation is also being used. Faced with many possible measurement problems and a very large number of metrology instruments, employing diverse technologies, the selection of the appropriat...

2005
Erik Novak Der-Shen Wan Paul Unruh Michael Schurig

− Accurate measurements of MEMS surfaces, geometries and motions are crucial to achieving the desired performance of the devices. The wide variety of MEMS devices in development and production requires very flexible metrology for single-platform characterization. In addition to having greatly varying geometries, devices must also be characterized statically and under actuation. White-light inte...

Journal: :Journal of the Japan Society for Precision Engineering 2009

2002
Xiaoming Lu D Tran

Abstract Two-dimensional precision stages for semiconductor lithography require sub-nm-level accuracy. Current ultraprecision stage metrology based on heterodyne laser interferometers with a 632.8-nm HeNe laser and interpolation to λ/2048 provide resolution of 0.3 nm. Unfortunately, the refractive index of air varies with CO2 and water vapor content, as well as with air turbulence. Without expe...

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