*Correspondence: T. D. Silva. Departamento de Farmácia. Faculdade de Ciências Biológicas e da Saúde. Universidade Federal dos Vales do Jequitinhonha e Mucuri, Campus JK. Rodovia MGT 367, Km 583, n° 5000, 39100-000, Diamantina, MG, Brasil. E-mail: [email protected] Development and validation of alternative methods by non-aqueous acid-base titration and derivative ultraviolet spectrophoto...

We describe a method for the 7-min determination of theophylline in less than 100 muL of serum. The procedure requires no centrifugation or solvent evaporation after extraction. Butylation is done on the gas-chromatographic column by injecting the serum extract followed by a butylating mixture which contains 1-iodobutane as the alkylating agent. The method is precise, accurate, and free of inte...

Studies that have attempted to estimate the rate of deleterious mutation have typically been conducted under low levels of ultraviolet-B (UV-B) radiation, a naturally occurring mutagen. We conducted experiments to test whether the inclusion of natural levels of UV-B radiation in mutation-accumulation (MA) experiments influences the rate and effects of mildly deleterious mutation in the plant Ar...

Thin metallic films are used as passband filters in space telescopes operating in the extreme ultraviolet (EUV). Because of their thinness, typically 100 to 200 nm, they are very sensitive to static pressure differentials and to mechanic and acoustic vibrations. Therefore, they are difficult to manage in all phases of a space program, from manufacturing to vacuum testing to launch. A common sol...

We investigate the extreme-ultraviolet (EUV) emission from targets that contain tin as an impurity and the advantages of using these targets for ion debris mitigation by use of a magnetic field. The EUV spectral features were characterized by a transmission grating spectrograph. The in-band EUV emission energy was measured with a calorimeter of absolute calibration. The ion flux coming from the...

Discharge sources in tin vapor have recently been receiving increased attention as candidate extreme ultraviolet (EUV) light sources for application in semiconductor lithography, because of their favorable spectrum near 13.5 nm. In the ASML EUV laboratory, time-resolved pinhole imaging in the EUV and two-dimensional imaging in visible light have been applied for qualitative characterization of ...

We describe a momentum imaging setup for direct time-resolved studies of ionization-induced molecular dynamics. This system uses a tabletop ultrafast extreme-ultraviolet (EUV) light source based on high harmonic upconversion of a femtosecond laser. The high photon energy (around 42 eV) allows access to inner-valence states of a variety of small molecules via single photon excitation, while the ...

We compare the reflectance and stability of multilayers comprising either Si/Mo, Si/Mo2C, Si/B4C, Si/C, or Si/SiC bilayers, designed for use as extreme-ultraviolet (EUV) reflective coatings. The films were deposited by using magnetron sputtering and characterized by both x-ray and EUV reflectometry. We find that the new Si/SiC multilayer offers the greatest spectral selectivity at the longer wa...

Extreme ultraviolet lithography (EUVL) has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10 nm. We present a new pellicle material, nanometer-thick graphite film (NGF), which shows an extreme ultraviolet (EUV) transmission of 92% at a thickness of 18 nm. The maximum temperature induced by laser irradiation (λ = 800 nm) of 9.9...

Ultraviolet-B (UV-B) radiation and elevated tropospheric ozone may cause reductions in the productivity and quality of important agricultural crops. However, research regarding their interactive effect is still scarce, especially on the belowground processes. Using the open top chambers experimental setup, we monitored the response of soil nematodes to the elevated O3 and UV-B radiation individ...