نتایج جستجو برای: total etch system
تعداد نتایج: 2910034 فیلتر نتایج به سال:
Abstract: In this paper, a DRIE process for fabricating MEMS silicon trenches with a depth of more than 250 m is described. The DRIE was produced in oxygen-added sulfur hexafluoride (SF6) plasma, with sample cooling to cryogenic temperature using a Plasmalab System 100 ICP 180 at different RF powers. A series of experiments were performed to determine the etch rate and selectivity of the some m...
AIM Core buildup composite resins with prefabricated posts are commonly used to restore endodontically treated teeth. This study compared the sealing ability of Core Max II and Panavia F2.0 cement with total-etch and self-etch adhesive systems. METHODS AND MATERIALS Sixty recently extracted human second premolar teeth were chosen and their crowns were cut 3 mm above the CEJ. After preparing p...
We present analytical and computational models used to investigate the dependence of etch resolution on pulse duration, tool radius, and etched feature aspect ratio in electrochemical machining with ultrashort voltage pulses. Our results predict that, for the high aspect ratio system in which the effect of trench top and bottom edges can be ignored, the increase of etch resolution with pulse le...
Background: The newly introduced self-adhering flowable resin-composites decrease the required time for application by incorporation of an acidic adhesive monomer, thus reducing the number of steps, but its bonding is still uncertain. The aim of this study was to evaluate the interfacial microscopic examination and chemical analysis at the resin-dentin interface of a self-adhering flowable resi...
A gas-phase, room-temperature, plasmaless isotropic etching system has been used for bulk and thin lm silicon etching. A computer controlled multi-chambered etcher is used to provide precisely metered pulses of xenon di uoride (XeF2) gas to the etch chamber. Etch rates as high as 15 microns per minute have been observed. The etch appears to have in nite selectivity to many common thin lms, incl...
Grass’ formation is the very common defects for via etch process when using a BCl3/Cl2 as basic gases in an inductively coupled plasma (ICP) system. Presence of grass can potentially degrade device performance due to poor metallization coverage. In this study we found that grass formation strongly depends on GaAs surface condition prior to etch. Any surface contaminants, such as photo resist re...
Objective: A clinical challenge of using zirconia frameworks is to achieve adequate bond with different substrates. This study aimed to evaluate the effect of bioglass and silica coating of zirconia substrates on microshear bond strength of resin cement to tetragonal zirconia. Methods: This laboratory experimental study was conducted on zirconia discs. A total of 120 YTZP zirconia (Zirkonzahn) ...
Carious dentin is partially demineralized and contains mineral crystals in the tubules. This may permit the deeper etching of intertubular dentin but prevent resin tag formation during bonding. We hypothesize that resin adhesives will produce lower bond strengths to caries-infected and caries-affected dentin compared with normal dentin. We tested this by measuring the microtensile bond strength...
Improvements in dentin bonding systems have influenced modern restorative dentistry. The desire for minimal invasiveness has resulted in more-conservative cavity design, which basically relies on the effectiveness of current dentin bonding systems. Interaction of adhesives with enamel and dentin is based on two systems, commonly described as etch-and-rinse and self-etch. Priming and bonding age...
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