Experimental methods Preparation of the IDT. The IDT device was fabricated as described previously [1, 2], employing standard photolithography. The device consisted of gold interdigitated electrodes, with a pitch d=350 µm, and width w=175 µm on a 128 o Y-cut X-propagating 3 inch LiNbO 3 wafer, patterned using lift-off process. The aperture of the device was 20 mm. The resonance frequency of the...
