Arc and glow discharges are defined based on their cathode processes. Arcs are characterized by collective electron emission, which can be stationary with hot cathodes (thermionic arcs), or nonstationary with cold cathodes (cathodic arcs). A brief review on cathodic arc properties serves as the starting point to better understand arcing phenomena in sputtering. Although arcing occurs in both me...

The transition metal nitrides like titanium nitride exhibit very interesting color variation properties depending on the different plasma deposition conditions using cylindrical magnetron sputtering method. It is found in this deposition study that nitrogen partial pressure in the reactive gas discharge environment plays a significant role on the color variation of the film coatings on bell-met...

Magnetron sputtering is a widely used physical vapor deposition technique for deposition and formation of nanocatalyst thin films and clusters. Nevertheless, so far only few studies investigated this formation process at the fundamental level. We here review atomic scale molecular dynamics simulations aimed at elucidating the nanocatalyst growth process through magnetron sputtering. We first in...

Thermochromic coatings based on vanadium dioxide exhibit great potential in various fields, including smart energy-saving windows with temperature-dependent transmittance the infrared at preserved visible. However, these promises come challenges concerning low-temperature preparation of high-quality crystalline VO 2 -based films by industry-friendly techniques and simultaneous optimization all ...

In this paper, we present a chemiresistive metal oxide (MOX) sensor for detection of hydrogen sulfide. Compared to the previous reports, the overall sensor performance was improved in multiple characteristics, including: sensitivity, selectivity, stability, activation time, response time, recovery time, and activation temperature. The superior sensor performance was attributed to the utilizatio...

Measurements were carried out on radio-frequency magnetron-sputtered amorphous and microcrystalline gallium-arsenide (GaAs) films, which were fabricated under various sputtering conditions such as annealing temperature (up to 450˚C), substrate temperature (up to 200˚C), sputtering pressure (up to 20 mTorr), rf sputtering power (up to 800 W), and hydrogen partial pressure (25% H 2 in a mixture w...