Two and three dimensional polymeric structures at the nano and micro scale are increasingly being incorporated into micro and nano scale devices. Soft lithography can be employed for the creation of templates where a polymer replica can be produced. Obtaining a master is one of the limiting factors in the production of such replicas. This study demonstrates pattern generation on a highly durabl...

Nano imprint lithography(NIL) is a cost-efficient, highthroughput processing technique to transfer nano-scale patterns onto thin polymer films. Polymers used as the resist include UV cured resins as well as thermoplastics such as polymethyl-methacrylate(PMMA). In this study, an analytic investigation was performed for the NIL process of transferring nano scale patterns onto polymeric films. Pro...

Lithography, the fundamental fabrication process of semiconductor devices, is playing a critical role nowadays in the fabrication of microand nano-structures especially for the realization of micro-electro-mechanical systems (MEMS), microfluidic devices, photonic crystals, photonic integrated circuits, micro-optics, and plasmonic optoelectronic devices. These devices have various practical appl...

In this work, the position-controlled growth of GaN nanowires on sapphire wafers and on N-polar GaN templates is presented using selective area vapor-liquid-solid growth in a metalorganic vapor phase reactor. Misoriented sapphire wafers and TMIn acting as surfactant are applied in order to achieve N-polar GaN buffer layers with high crystal and surface quality, suitable for a subsequent nano-pa...

In article number 1500232, Y. B. Zheng and co-workers extend the scope of multi-photon plasmonic lithography to immobilize biomolecules. Protein hydrogels are precisely immobilized at the tips of a single gold nanotriangle. This process is tracked on single nanoparticles using dark-field scattering spectroscopy. These protein nano-anchors can serve as frameworks to study plasmon–molecule intera...

We present a technique to fabricate nano wires on silicon substrates without any lithography. The wires are 50 nm or less in width, but their lengths can be 10s of micro meters. They can be formed by a single or multiple layers of metals. The wires can be designed to form a network which can be partially released from the substrate to form 3D structures. Such structures may serve as actuators o...

We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment sy...

The Nanorobotics series developed by Klocke Nanotechnik extend Scanning Electron or Ion Microscopes to material processing systems. The included automation allows the whole field of handling, assembly and manufacturing like known from a normal desktop system – now with nano-precision, including various kinds of image generation by using different sensors. Applications are in the field of Materi...