نتایج جستجو برای: metallorganic chemical vapor deposition
تعداد نتایج: 477209 فیلتر نتایج به سال:
Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition
Introduction Silicon oxynitride is a flexible material for use as planar optical waveguides because by changing the composition ( O N ratio) the refractive index can be tuned from 1.46 to 2.0'. Several methods can be used for deposition: PECVD, LPCVD and sputtering. The advantages of PECVD are easy control of composition, high deposition rate and low stress. A disadvantage is the high hydrogen ...
For the first time, patterned growth of boron nitride nanotubes is achieved by catalytic chemical vapor deposition (CCVD) at 1200 C using MgO, Ni, or Fe as the catalysts, and an Al2O3 diffusion barrier as underlayer. The as-grown BNNTs are clean, vertically aligned, and have high crystallinity. Near band-edge absorption ∼6.0 eV is detected, without significant sub-band absorption centers. Elect...
A comparative study of DC, RF and VHF excitation for the plasma enhanced chemical vapor deposition (PECVD) of intrinsic layers of a-Si:H is presented, with special emphasis on the effects of hydrogen dilution. Growth rates at comparable plasma power, for substrate temperatures between 100°C and 300°C and for various H2 dilution ratios are presented, along with optical bandgap, H content, and el...
Articles you may be interested in Effects of plasma and vacuum-ultraviolet exposure on the mechanical properties of low-k porous organosilicate glass J. Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation Appl. Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition Plasma...
We present preliminary results on a microfabrication approach to enable the integration of high yield, uniform, and preferential growth of vertically aligned carbon nanotubes ~VACNTs! on low-stress micromechanical structures using a combination of ‘‘electron-beam crosslinked’’ poly~methylmethacrylate! surface nanomachining and direct current plasma enhanced chemical vapor deposition of electric...
the lack of complete understanding of the substrate effects on carbon nanotubes (cnts) growth poses a lot oftechnical challenges. here, we report the direct growth of nanostructures such as the cnts on stainless steel 304and brass substrates using thermal chemical vapor deposition (tcvd) process with c2h2 gas as carbon sourceand hydrogen as supporting gas mixed in ar gas flow. we used an especi...
carbon nanotubes (cnts), nowadays, are one of the important nanomaterials that can be produce with different methods such as chemical vapor deposition (cvd). growing of cnts via cvd method can be influenced by several operating parameters that can affect their quality and quantity. in this article, the effects of inlet gas mixture temperature on cnt’s local growth rate, total production, and le...
Chemical vapor deposition and infiltration of pyrolytic carbon for the production of carbon fiber reinforced carbon is studied by modeling approaches and computational tools developed recently. Firstly, the development of a gas-phase reaction mechanism of chemical vapor deposition (CVD) of carbon from unsaturated light hydrocarbons (C2H4, C2H2, and C3H6) is presented. The mechanism consisting o...
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