نتایج جستجو برای: magnetron

تعداد نتایج: 4577  

2007
J. Alami P. Eklund J. Emmerlich O. Wilhelmsson U. Jansson H. Högberg L. Hultman U. Helmersson

We have deposited Ti-Si-C thin films using high-power impulse magnetron sputtering (HIPIMS) from a Ti3SiC2 compound target. The as-deposited films were composite materials with TiC as the main crystalline constituent. X-ray diffraction and photoelectron spectroscopy indicated that they also contained amorphous SiC, and for films deposited on inclined substrates, crystalline Ti5Si3Cx. The film m...

2016
Keke Chang Denis Music Moritz to Baben Dennis Lange Hamid Bolvardi Jochen M. Schneider

A method to model the metastable phase formation in the Cu-W system based on the critical surface diffusion distance has been developed. The driver for the formation of a second phase is the critical diffusion distance which is dependent on the solubility of W in Cu and on the solubility of Cu in W. Based on comparative theoretical and experimental data, we can describe the relationship between...

2011
María Arroyo-Hernández Raquel Álvaro Sheila Serrano José Luis Costa-Krämer

The catalytic effect of gold seed particles deposited on a substrate prior to zinc oxide (ZnO) thin film growth by magnetron sputtering was investigated. For this purpose, selected ultra thin gold layers, with thicknesses close to the percolation threshold, are deposited by thermal evaporation in ultra high vacuum (UHV) conditions and subsequently annealed to form gold nanodroplets. The ZnO str...

Journal: :Physical review letters 2002
H F Powell D M Segal R C Thompson

We report the first demonstration of the axialization of laser cooled ions in a Penning trap. Axialization involves the application of a small radial quadrupole drive which couples the cyclotron and magnetron motions. This enhances the laser cooling, allowing tighter confinement of the ions to the central axis of the trap than is otherwise possible. Using an intensified charge-coupled device (I...

2015
T. Weichsel

IMALION which stands for IMplantation of ALuminum IONs is a facility designed for high-current metal ion beam implantation and surface modification such as in semiconductor, medical or optical industry. IMALION is a newly developed 30 kV metal ion wide area implantation platform, which is suitable for the irradiation of a target width of 200 mm to produce homogeneous implantation profiles over ...

2014
J. He J. C. Jiang

Perovskite BaTiO3 thin films have a wide range of applications for advanced devices. Especially, epitaxial BaTiO3 thin films are highly desirable for these advanced applications. So far, such epitaxial BaTiO3 films have been successfully fabricated on different single-crystal substrates using various deposition techniques including RF magnetron sputtering, molecular beam epitaxy, metallorganic ...

Journal: :Journal of the Mass Spectrometry Society of Japan 1963

Journal: :journal of sciences islamic republic of iran 0

copper films of 300 nm thickness deposited by planar magnetron sputtering on glass substrates, for substrate temperatures between 300 and 500 k, and deposition rate of 10 ?s?1. microstructure of these films was obtained by x-ray diffraction, while the texture mode of diffractometer was used for stress measurement by the sin2? technique. the components of the stress tensor are obtained using mea...

2008
Jérôme Pétri

Context. The physics of the pulsar magnetosphere near the neutron star surface remains poorly constrained by observations. Although about 2000 pulsars have been discovered to date, little is known about their emission mechanism, from radio to high-energy X-ray and gamma-rays. Large vacuum gaps probably exist in the magnetosphere, and a non-neutral plasma partially fills the neutron star surroun...

Journal: :Chemical communications 2007
Elena Selli Gian Luca Chiarello Eliana Quartarone Piercarlo Mustarelli Ilenia Rossetti Lucio Forni

A two-compartment Plexiglas cell has been set up and tested for separate hydrogen and oxygen production from photocatalytic water splitting on a thin TiO2 layer deposited by magnetron sputtering on a flat Ti electrode inserted between the two cell compartments.

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