By combining laser interference lithography and metal-assisted etching we were able to produce arrays of silicon nanowires with uniform diameters as small as 65 nm and densities exceeding 2 x 10(7) mm(-2). The wires are single crystalline, vertically aligned, arranged in a square pattern and obey strict periodicity over several cm(2). The applied technique allows for a tailoring of nanowire siz...

In order to address the crucial problem of high-resolution low line-edge roughness resist for extreme ultraviolet (EUV) lithography, researchers require significant levels of access to high-resolution EUV exposure tools. The prohibitively high cost of such tools, even microfield tools, has greatly limited this availability and arguably hindered progress in the area of EUV resists. To address th...

We have developed a fixed beam direct writing laser lithography system with a resolution of 400 nm at 457 nm wavelength and a writing speed of 4.2 mm/s with total system costs of less than 100 000 US$. Keyword: Laser lithography system

The current nanofabrication techniques including electron beam lithography provide fabrication resolution in the nanometre range. The major limitation of these techniques is their incapability of arbitrary three-dimensional nanofabrication. This has stimulated the rapid development of far-field three-dimensional optical beam lithography where a laser beam is focused for maskless direct writing....

Antidot lattices made of magnetic thin films are good candidates to be employed in future recording media. In this manuscript we present a study on the effect shape and field-induced anisotropies magnetization reversal 10 nm 50 thick permalloy antidot lattices. Rounded square were fabricated using combination electron beam evaporation laser interference lithography, covering surfaces few cm2. W...

Laser interference patterning or lithography has been used in variety of the applications using, patterning, masking and processing structures at top material. It offers fast over as large areas can be processed simultaneously. Additionally, fine patterns are possible to achieve both micro sub-micro scale. In this manuscript is presented novel concept combine high-pressure environment. With aid...