As optical lithography reaches it physical limits, alternative technologies become interesting. There have been several such alternatives that are still optical, but have some departure from conventional projection methods. This papers presents some of these alternative optical technologies, namely the use of surface plasmons and plasmonic lithography, metamaterials and superlenses, evanescent ...

We propose a novel technique for the magnetoplasmonic nanostructures fabrication based on pulse force nanolithography method. It allows one to create high-quality that have lower total losses than gratings made by electron beam lithography. The method provides control of SPP excitation efficiency varying grating parameters such as scratching depth or number scratches in single period. quality p...

Fabrication of Through-glass Vias (TGV) based 3D microstructures in glass substrate by a lithography-free process is presented. Through-holes having an opening size ∼ 300–500 µm and spiral-shaped embedded redistribution lines 290 width 50 depth were directly created 400 μm thick the electrochemical discharge machining. A 20 nm conformal seed layer was deposited electroless nickel deposition, wh...

RATIONALE As the spatial resolution of mass spectrometry imaging technologies has begun to reach into the nanometer regime, finding readily available or easily made resolution reference materials has become particularly challenging for molecular imaging purposes. This paper describes the fabrication, characterization and use of vertical line array polymeric spatial resolution test patterns for ...

Abstract Surface nanopatterning of semiconductor optoelectronic devices is a powerful way to improve their quality and performance. However, photoelectric devices’ inherent stress sensitivity inevitable warpage pose huge challenge on fabricating nanostructures large-scale. Electric-driven flexible-roller nanoimprint lithography for the wafer proposed in this study. The flexible template twining...

3.2. Two-Photon Lithography (TPL) 919 4. Serial Writing with Charged Particles 920 4.1. Electron Beam Lithography 920 4.2. Ion Beam Lithography 920 4.3. Scanning Probe Resist Lithography 921 5. Microand Nanomachining 921 5.1. Focused Ion Beam 921 5.2. Scanning Probe Nanomachining 921 6. Direct Writing and Material Deposition 921 7. Moulding 922 7.1. Mould Fabrication 922 7.2. Demoulding: Mould ...

The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...