Surface modification of dental implants is a key process in the production of these medical devices, and especially titanium implants used in the dental practice are commonly subjected to surface modification processes before their clinical use. A wide range of treatments, such as sand blasting, acid etching, plasma etching, plasma spray deposition, sputtering deposition and cathodic arc deposi...

Physicochemical properties of thin films on the base titanium oxides, obtained by a cathodic arc evaporation surface glass substrate are analysed in details. The analysis these was made using XRD, FTIR, SEM, XPS and ellipsometry. On basis analyses, particularly XPS, oxidative state Ti corresponding phases determined through various film layers from to substrate. depth levels their extinction co...

Titanium Nitride (TiN) coatings have led the way for providing increased wear resistance and extended life of cutting tools, whether carbide inserts or high-speed steel. Where the earliest applications were for high temperature substrate materials (carbides) and chemical vapor deposition (CVD) was the process of choice, later developments in the physical vapor deposition (PVD) technology, espec...

Aluminum nitride (AlN) film coatings have been obtained by a new technique of hybrid helikon-arc ion-plasma deposition. Possibility to combine the magnetic-filtered arc plasma deposition technique with a treatment in RF plasma of helicon discharge allowed us to deposit AlN coatings on thermolabile substrates, significantly increasing the deposition rate. A study of spectral properties of AlN fi...

TiN/AlTiN ; TiN/CrN and CrN/AlTiN multilayer coatings have been deposited by the cathodic arc evaporation technique. The period is in the range 7 – 200 nm for a total thichness of 3 μm. The period’s control of the nanoscaled hard films is achieved, a priori, by way of a simple geometrical calculation and, a posteriori, via both X-ray diffraction and transmission electron microscopy on cross-sec...