Y-doped TaON films were grown on (001)YSZ and (012)Al2O3 substrates by radio frequency (RF) magnetron reactive sputtering deposition from Ta metal target Y chips under the mixture gases of N2, O2 Ar gases. Films with various content prepared changing area ratio Y/(Y + Ta) target. The pure monoclinic phase was obtained for both controlling partial pressure N2 gasses. Crystal structure changed to...

PURPOSE The purpose of this study was to assess the surface characteristics and the biocompatibility of zirconium (Zr) coating on Ti-6Al-4V alloy surface by radio frequency (RF) magnetron sputtering method. MATERIALS AND METHODS The zirconium films were developed on Ti-6Al-4V discs using RF magnetron sputtering method. Surface profile, surface composition, surface roughness and surface energy...

By using Radio Frequency (RF) magnetron sputtering method, Pb(Zr0.5Ti0.5)O3 (PZT) thin films were deposited on Pt/Ti/ SiO2/Si substrates. Pt/Ti bottom electrode was fabricated on SiO2/Si substrates by magnetron dual-facing-target sputtering system. Phase and crystalline structure analyses of the PZT films were performed on an X-ray diffraction(XRD), Surface morphology, roughness and particle si...

Spray pyrolysis technique (SPT) and radio-frequency magnetron sputtering (RF-MS) were used to obtain vanadium oxide (VxOy) layers. The surface morphology was visualized using scanning electron microscopy (SEM) atomic force (AFM). Further, t

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Vanadium dioxide (VO2) undergoes a metal–insulator phase transition at ∼70 °C and has attracted substantial interest for potential applications in electronics, including those neuromorphic computing. The vanadium–oxygen system rather complicated diagram, controlling the stoichiometry of thin films vanadium oxides is well-known challenge. We explore novel combination two methods VO2 film deposit...

Effect of polarity in substrate for ZnO growth was researched. The zinc oxide films were deposited on SiOC/Si wafer by a RF magnetron sputtering system. SiOC film was also deposited by RF magnetron sputtering to obtain a low temperature process. Polarity in SiOC film changed with increasing the oxygen gas flow rates, and the chemical shift in the PL spectra was observed because of lowering the ...

a cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. the substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. the al/ cu multilayer film was deposited on the glass substrate at the following conditions: working g...